- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/26 - Phase shift masks [PSM]; PSM blanks; Preparation thereof
Patent holdings for IPC class G03F 1/26
Total number of patents in this class: 327
10-year publication summary
33
|
30
|
38
|
37
|
40
|
31
|
28
|
22
|
19
|
6
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Hoya Corporation | 2822 |
64 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
54 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
40 |
Samsung Electronics Co., Ltd. | 131630 |
13 |
Boe Technology Group Co., Ltd. | 35384 |
12 |
S&S Tech Co., Ltd. | 26 |
10 |
Applied Materials, Inc. | 16587 |
9 |
SK Hynix Inc. | 11030 |
9 |
Samsung Display Co., Ltd. | 30585 |
6 |
Beijing BOE Display Technology Co., Ltd. | 2497 |
6 |
Agc, Inc. | 4029 |
6 |
Carl Zeiss SMT GmbH | 2646 |
5 |
ASML Netherlands B.V. | 6816 |
4 |
KLA-Tencor Corporation | 2574 |
4 |
National Research Council of Canada | 1545 |
4 |
Toppan Photomask Co., Ltd. | 56 |
4 |
Nikon Corporation | 7162 |
3 |
Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8635 |
3 |
Beijing BOE Optoelectronics Technology Co., Ltd. | 3779 |
3 |
ULVAC Coating Corporation | 17 |
3 |
Other owners | 65 |